October 2018: Silicon Photonics Enlighten Conference @ PHOTONEX EUROPE

Dr Callum Littlejohns, conference co-chair and CORNERSTONE team member, together with the event sponsors, invite you to attend the 2nd silicon photonics Enlighten conference at the PHOTONEX EUROPE exhibition on Wednesday 10th October 2018.

The aim of the conference, entitled "Industry & Academia: Working Together in Silicon Photonics", is to bring together members of both the academic and industrial communities to consider ways to work more effectively together in mutually beneficial collaborations.

Professor Graham Reed will be presenting a talk entitled "Rapid prototyping using the CORNERSTONE platform" at 11:10.

In addition, the Optoelectronics Research Centre invites you for complementary drinks at their exhibition stand after the speaker programme finishes at 16:30. One lucky winner will receive a £50 Amazon gift voucher. Just drop your business card into the entry box for your chance to win. All entrants agree to be added to the CORNERSTONE mailing list.

Registration for the event is free. Please visit: https://xmark18.reg.buzz

More information, including the full programme, can be found on the PHOTONEX website: www.photonex.org/conference/silicon-photonics.html

September 2018: University of Southampton Industry Day

CORNERSTONE will be represented at the University of Southampton Future Photonics Hub Industry day on 20th September 2018.

In addition to the exhibition stand, where you will be able to meet members of the CORNERSTONE team, Professor Graham Reed will be giving a talk about the CORNERSTONE project as part of the invited speakers program.

For more information, and to register for your free delegate pass, visit the Optoelectronics Research Centre website:

www.orc.soton.ac.uk/events

CORNERSTONE Multi Project Wafer Run 9 Announced

The design rules for CORNERSTONE multi project wafer (MPW) run 9 on the 500 nm Si / 3 µm BOX SOI platform have been announced. We will offer 2 Si etch processes: 1) a shallow Si etch of 160 nm (grating couplers), and 2) a partial Si etch of 300 nm (rib waveguides). We will also offer a 1 µm thick silicon dioxide top cladding layer.

Once again, a process design kit (PDK) has been made available using Luceda’s IPKISS software, subject to purchasing the appropriate license. To obtain a copy of the software and a license key, please contact Luceda by sending an email to This email address is being protected from spambots. You need JavaScript enabled to view it., specifying that you require a license for CORNERSTONE PDK usage. Of course, the CORNERSTONE PDK is free of charge if you already have a valid IPKISS license.  

Access to this run is free of charge for UK research institutes (funded by EPSRC). Overseas universities and industrial companies can access this run with the following cost options:

Design area: 11.47 mm x 4.9 mm = £5,000.

Design area: 5.5 mm x 4.9 mm = £3,500.

The full design rules and .gds mask template can be found here.

The mask submission deadline is Friday 30th November 2018.

For more information on future calls, visit the Schedule & Cost page.

CORNERSTONE Multi Project Wafer Run 8 Announced

The design rules for CORNERSTONE multi project wafer (MPW) run 8 on the 220 nm Si / 2 µm BOX SOI platform have been announced. We will offer 2 Si etch processes: 1) a shallow Si etch of 70 nm (grating couplers), and 2) a partial Si etch of 120 nm (rib waveguides). We will also offer a 1 µm thick silicon dioxide top cladding layer.

This call is intended as a test bed for the next active device call on this platform, later in the year.

Once again, a process design kit (PDK) has been made available using Luceda’s IPKISS software, subject to purchasing the appropriate license. To obtain a copy of the software and a license key, please contact Luceda by sending an email to This email address is being protected from spambots. You need JavaScript enabled to view it., specifying that you require a license for CORNERSTONE PDK usage. Of course, the CORNERSTONE PDK is free of charge if you already have a valid IPKISS license.  

Access to this run is free of charge for UK research institutes (funded by EPSRC). Overseas universities and industrial companies can access this run with the following cost options:

Design area: 11.47 mm x 4.9 mm = £5,000.

Design area: 5.5 mm x 4.9 mm = £3,500.

The mask submission deadline is Friday 31st August 2018.

For more information on future calls, visit the Schedule & Cost page.

April 2018: Visit the CORNERSTONE Stand at PIC International Conference

We invite you to visit us at the CORNERSTONE exhibition stand at the upcoming PIC International Conference in Brussels, Belgium on 10-11 April. One lucky guest will be given the opportunity to access an upcoming “Passives with Heaters” call for FREE. To enter the free draw, place your business card in the bowl at our exhibition stand. By doing so, you will also be kept up to date with all future CORNERSTONE MPW calls.

In addition, Professor Graham Reed will be giving a talk at 11:05 on Wednesday 11th April to give more information on the CORNERSTONE project.

The PIC website contains more information: www.picinternational.net

CORNERSTONE Multi Project Wafer Run 7 Announced

The design rules for CORNERSTONE multi project wafer (MPW) run 7 on the 340 nm Si / 2 µm BOX SOI platform have been announced. We will offer 3 Si etch processes: 1) a shallow Si etch of 140 nm (grating couplers), 2) a full 340 nm etch to the BOX layer (strip waveguides), and 3) a high resolution full 340 nm etch to the BOX layer (photonic crystals) with a minimum feature size of 100 nm.

This call is a result of user feedback informing us of the high demand for high resolution etch layers.

Once again, a process design kit (PDK) has been made available using Luceda’s IPKISS software, subject to purchasing the appropriate license. To obtain a copy of the software and a license key, please contact Luceda by sending an email to This email address is being protected from spambots. You need JavaScript enabled to view it., specifying that you require a license for CORNERSTONE PDK usage. Of course, the CORNERSTONE PDK is free of charge if you already have a valid IPKISS license.  

Access to this run is free of charge for UK research institutes (funded by EPSRC). Overseas universities and industrial companies can access this run with the following cost options:

Design area: 11.47 mm x 4.9 mm = £5,000.

Design area: 5.5 mm x 4.9 mm = £3,500.

The mask submission deadline is Friday 25th May 2018.

For more information on future calls, visit the Schedule & Cost page.