DUV Lithography Service
We offer an affordable and efficient deep-UV projection lithography service for 8” (200 mm) substrates.
Our deep-UV lithography service is capable of patterning 200 nm features.
The service is currently free-of-charge to UK academics, funded by EPSRC under the CORNERSTONE 2 programme. UK academics will only be charged for the reticle and substrate cost (if applicable).
The below video shows the lithography process in action.
Cost:
|
Item |
Cost industry (£) |
Cost international academic (£) |
Cost UK academic (£) |
|
Setup & 1st wafer |
£2,500 |
£1,000 |
£0 |
|
Each additional wafer |
£175 |
£75 |
£0 |
Example cost per batch:
|
Number of Wafers |
Cost industry (£) |
Cost international academic (£) |
Cost UK academic (£) |
|
1 |
£2,500 |
£1,000 |
£0 |
|
10 |
£4,075 |
£1,675 |
£0 |
|
25 |
£6,700 |
£2,800 |
£0 |
Reticle cost:
|
Mask Grade |
Pellicle* |
Address Size Reticle (µm) |
Min. Feature Size Reticle (µm) |
Min. Feature Size Wafer (µm)† |
CD Tolerance Reticle (µm) |
Defect Density (µm) |
Cost (£) |
|
Standard |
No |
0.0625 |
2 |
0.5 |
0.15 |
0>1.0 |
£790 |
|
High |
No |
0.005 |
0.8 |
0.2 |
0.08 |
0>0.5 |
£1,350 |
|
Ultra-High |
No |
0.005 |
0.5 |
0.125 |
0.03 |
0>0.25 |
£2595 |
|
Standard |
Yes |
0.0625 |
2 |
0.5 |
0.15 |
0>1.0 |
£955 |
|
High |
Yes |
0.005 |
0.8 |
0.2 |
0.08 |
0>0.5 |
£1,580 |
|
Ultra-High |
Yes |
0.005 |
0.5 |
0.125 |
0.03 |
0>0.25 |
£2,935 |
*A pellicle is a protective film which is placed out of the focal plane on the reticle to protect it from dust and other particles. This is typically only used for production reticles which are frequently used.
†The feature size is shrunk by 4x on the wafer relative to the reticle. Users should submit their gds file with dimensions as on the wafer. The mask shop will perform the 4x expansion of feature size.
For design rule guidelines, please contact us.
When ready to submit a job, please do so via our DUV Job Submission Form.