CORNERSTONE is a rapid prototyping multi-project-wafer (MPW) capability that utilises industrially-compatible tools (e.g. deep-UV projection lithography), to enable seamless scaling-up of production volumes, whilst also retaining device level innovation capability using high-resolution lithography (e-beam) and versatile processes.
The up to TRL 5 technology platform is a collaboration between the Universities of Southampton, Glasgow and Surrey in the UK, with the majority of the processing taking place in the Optoelectronics Research Centre’s cleanrooms at the University of Southampton, where a 248 nm Nikon Scanner is installed. Lower TRL opportunities are also available for researchers and innovators to test experimental designs.
Presently, CORNERSTONE offers 3 different silicon-on-insulator platforms (220 nm Si / 2 µm BOX, 340 nm Si / 2 µm BOX and 500 nm Si / 3 µm BOX), enabling a plethora of applications including telecoms, mid-infrared sensing etc. The unique hybrid processing (DUV projection lithography and e-beam lithography) capability renders the CORNERSTONE platform attractive to both academia and industry, and is able to mimic advanced industrial processes.
CORNERSTONE is an open access technology which operates approximately 6 MPW calls per year, in addition to bespoke fabrication batches (available on request).
Additionally, the capabilities of the Silicon Photonics Group at the University of Southampton can be downloaded below.